| 摘要 |
PROBLEM TO BE SOLVED: To facilitate a subfield multiple lithography and a stripe multiple lithography by a method, wherein subfields are set independently of pattern data, whether or not which subfield of the subfields each graphic form is put in is decided and at the same tome, the largest size of the region which is occupies by groups of the small graphic forms constituting a pattern, is set within a difference or smaller between the sub-deflectable longest width of the largest size and the lattice period of the subfields. SOLUTION: Each graphic form is positioned on a prescribed subfield by a main deflector 15, the positioning of the drawing position of the graphic from within the subfield is performed by a sub-deflector 16 and at the same time, the shape of a beam is controlled by a beam dimension variable deflector 14, and beam molding apertures 17 and 18 and the subfield is subjected to a lithography processing while a stage 3 is continuously moved in one direction. Moreover, when a screwing of stripes which are respectively an aggregate of a plurality of the subfields ends, the stage 3 is step- moved in the direction orthogonally intersecting the continuous moving direction of the stage 3, and this processing is repeated for drawing each stripe region in order. Thereby, the subfield can be drawn using efficient pattern data without making the subfields overlap with each other. |
