| 摘要 |
PROBLEM TO BE SOLVED: To provide an aligner ands its pattern forming method using phase shift mask for the formation of a fine and dense contact hole pattern. SOLUTION: Exposure beams 56 are divided into first and second exposed spectra, to respectively irradiate a first and a second phase shift masks 10A, 10B therewith. The first and the second phase shift masks 10A, 10B are formed of a plurality of flare stoppers and of another plurality of band-like photo transmission parts held by the flare stoppers so as to alternately invert respective phases of the transmitted exposure beams. Finally, a photoresist is irradiated with the resultant transmission interference composited exposure beams 78. |
