发明名称 Method for making wavelength-selective phase-type optical low-pass antialiasing filter
摘要 A method of forming a wavelength-selective optical low-pass antiliasing filter for use with an optical imaging system of a solid-state color imager or the like is disclosed. The method includes coating a transparent glass wafer with a layer of transparent photopatternable organic polymer material having a thickness that is equal to the thickness of randomly placed transparent low-pass antiliasing filter spots, exposing the transparent photopatternable layer in areas to form a pattern of randomly placed spots in unexposed areas that correspond to the optical low-pass antiliasing filter, and developing the exposed transparent photopatternable layer to remove the exposed regions corresponding to pattern of randomly placed transparent low-pass antiliasing filter spots.
申请公布号 US5714284(A) 申请公布日期 1998.02.03
申请号 US19960647480 申请日期 1996.05.14
申请人 EASTMAN KODAK COMPANY 发明人 HIRSH, JEFFREY I.;WILSON, SHARLENE A.
分类号 G02B5/20;G02B27/46;G03F7/00;(IPC1-7):G03F9/00 主分类号 G02B5/20
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