发明名称 |
Method for making wavelength-selective phase-type optical low-pass antialiasing filter |
摘要 |
A method of forming a wavelength-selective optical low-pass antiliasing filter for use with an optical imaging system of a solid-state color imager or the like is disclosed. The method includes coating a transparent glass wafer with a layer of transparent photopatternable organic polymer material having a thickness that is equal to the thickness of randomly placed transparent low-pass antiliasing filter spots, exposing the transparent photopatternable layer in areas to form a pattern of randomly placed spots in unexposed areas that correspond to the optical low-pass antiliasing filter, and developing the exposed transparent photopatternable layer to remove the exposed regions corresponding to pattern of randomly placed transparent low-pass antiliasing filter spots.
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申请公布号 |
US5714284(A) |
申请公布日期 |
1998.02.03 |
申请号 |
US19960647480 |
申请日期 |
1996.05.14 |
申请人 |
EASTMAN KODAK COMPANY |
发明人 |
HIRSH, JEFFREY I.;WILSON, SHARLENE A. |
分类号 |
G02B5/20;G02B27/46;G03F7/00;(IPC1-7):G03F9/00 |
主分类号 |
G02B5/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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