发明名称 Propargyl ether-containing compositions useful for underfill applications
摘要 In accordance with the present invention, there are provided novel propargyl ether-based compositions that are very effective when used in underfill applications. Aromatic propargyl ether compounds are believed to represent the most robust resin chemistry currently available to meet the many performance requirements associated with underfill applications. Propargyl ether resins are hydrophobic, hydrolytically stable, low toxicity monomers that can be cured to high Tg, thermally stable thermosets. Liquid propargyl ether monomers have been found and/or described in the literature which can be used alone or in combination to yield diluent free underfill compositions. Alternatively, mixtures of two or more propargyl ether monomers (wherein one or more of these monomers may be solids at room temperature) can be used to create diluent-free, room temperature stable, eutectic or peritectic liquid resin compositions. In accordance with the present invention it has furthermore been found that transition metal compounds (in chelated or soap forms) can be used to catalyze the rapid cure of propargyl ether monomers. This cure is especially facile in the presence of additional coordinating ligand additives.
申请公布号 US5714086(A) 申请公布日期 1998.02.03
申请号 US19960694903 申请日期 1996.08.09
申请人 QUANTUM MATERIALS, INC. 发明人 OSUNA, JR., JOSE A.;DERSHEM, STEPHEN M.
分类号 C07C43/215;H01L21/56;H01L23/29;(IPC1-7):C09K3/00 主分类号 C07C43/215
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