| 摘要 |
A multizone illuminator rapid thermal processing system for fabricating a semiconductor device having a face on which an electronic medium is deposited. The system includes a processing chamber for establishing a semiconductor device fabrication environment for rapid thermal processing, an optically reflective gas injector for injecting a process gas into the semiconductor device fabrication environment, a semiconductor device holding mechanism for holding the semiconductor device in the semiconductor device fabrication environment, and a multizone illuminator positioned in association with the process chamber for illuminating the backside of the semiconductor device to perform a rapid semiconductor thermal process. The system can also include a multipoint temperature sensor system used in conjunction with a multizone variable temperature controller to increase dynamic temperature uniformity and repeatability control.
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