| 摘要 |
The present invention relates to a process for tetrafluoroethylene oxidation at temperatures ranging between -100 degree C and -40 degree C, in absence of ultraviolet radiation, and operating in presence of a chemical initiator containing at least a linkage F-X, wherein X is oxygen or halogen, in presence of a solvent comprising a COF2 quantity higher than 8 percent molar.
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