| 摘要 |
<p>PROBLEM TO BE SOLVED: To contemplate uniforming of the temperature distribution in a substrate surface, by preventing the generation of imbalance of the attraction force developed by the potential on the surface of the substrate in the ion beam irradiating condition, in a bipolar type electrostatic chuck. SOLUTION: To the positive electrode 10 and the negative electrode 12 of a bipolar type electrostatic chuck 6, a voltage adding a regulating voltage VA to almost set off the potential +VS on the surface of a substrate 4 in the ion beam irradiating condition is applied respectively from a chuck power source 14a. That is, the voltage of V+VA is applied to the positive electrode 10 from a positive power source 16a, while the voltage of -V+VA is applied to the negative electrode 12 from a negative power source 18a. The value of the regulating voltage VA is made almost equal to the potential VS.</p> |
