发明名称 |
Coating apparatus |
摘要 |
An apparatus for high speed manufacturing of thin-film coated products, wherein the coating thickness is even and the products do not contain uneven streaks. The apparatus includes a coating head having a frontedge disposed on an upstream side of a support, a backedge disposed on a downstream side of the support, and a top end receding stepwise away from the frontedge and away from the support. The backedge has an acute-angled top end portion. The coating apparatus is configured so that filtration central-line waves (WCA) are formed in a direction perpendicular to the direction of movement of the support. These waves are formed in slit inner surfaces, a frontedge surface and a backedge surface of a top end portion of the coating head. Each wave in these surfaces is less than or equal to 0.2 mu m in length.
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申请公布号 |
US5711807(A) |
申请公布日期 |
1998.01.27 |
申请号 |
US19940304238 |
申请日期 |
1994.09.12 |
申请人 |
FUJI PHOTO FILM CO., LTD. |
发明人 |
SUZUKI, AKIHIRO;SHIBATA, NORIO;TAKAHASHI, SHINSUKE;TOMARU, MIKIO |
分类号 |
B05C5/02;B05C9/06;B29C47/14;B32B37/15;G11B5/848;(IPC1-7):B05C3/02 |
主分类号 |
B05C5/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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