发明名称 Coating apparatus
摘要 An apparatus for high speed manufacturing of thin-film coated products, wherein the coating thickness is even and the products do not contain uneven streaks. The apparatus includes a coating head having a frontedge disposed on an upstream side of a support, a backedge disposed on a downstream side of the support, and a top end receding stepwise away from the frontedge and away from the support. The backedge has an acute-angled top end portion. The coating apparatus is configured so that filtration central-line waves (WCA) are formed in a direction perpendicular to the direction of movement of the support. These waves are formed in slit inner surfaces, a frontedge surface and a backedge surface of a top end portion of the coating head. Each wave in these surfaces is less than or equal to 0.2 mu m in length.
申请公布号 US5711807(A) 申请公布日期 1998.01.27
申请号 US19940304238 申请日期 1994.09.12
申请人 FUJI PHOTO FILM CO., LTD. 发明人 SUZUKI, AKIHIRO;SHIBATA, NORIO;TAKAHASHI, SHINSUKE;TOMARU, MIKIO
分类号 B05C5/02;B05C9/06;B29C47/14;B32B37/15;G11B5/848;(IPC1-7):B05C3/02 主分类号 B05C5/02
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