| 摘要 |
Oxide coatings are formed with a desired crystallographic texture over a large surface area. A metallic substrate is electrodeposited or vacuum deposited with a preferred crystallographic orientation, and a sol-gel/thermal process is used to form a "pseudo-epitaxial" oxide coating having crystallites that are influenced by the crystallographic orientation of the substrate. In one embodiment, p-type nickel oxide coatings with desirable electronic properties are produced by sol-gel/thermal processing on nickel substrates electrodeposited from a sulfamate nickel bath at a relatively high current density and low temperature. The electrodeposited nickel substrate has a strong Ni{100} preferred orientation. Epitaxial effects during sol-gel/thermal formation of NiO on the electrodeposited substrate enhance the extent to which the NiO{100} and NiO{111} crystal facets are aligned parallel to the coating surface, and minimize the NiO{110} orientation. This texture modification significantly improves the photoresponse of the nickel oxide coating. The method is anticipated to be useful in other metal oxide/metal substrate systems for the production of catalysts, cathodes for lithium ion and nickel-cadmium batteries, photoelectrochemical printed circuits, high-temperature electronic devices, flat panel displays, photoelectrochemical solar cells, and sensors. An advantage of the invention is that electrodeposition, vacuum deposition, and sol-gel/thermal processes are suitable for coating large surface areas.
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