发明名称 RADIATION-SENSITIVE COMPOSITION
摘要 <p>PROBLEM TO BE SOLVED: To obtain high sensitivity, wide latitude for development and good adhesion property during development by preparing a polymer by polymn. of specified monomers and monomers having acid groups. SOLUTION: The binder resin in the compsn. is composed of a polymer produced by copolymn. of monomers expressed by formula and monomers having acid groups. In formula, R is a hydrogen atom or methyl group, R1 to R5 are independently selected from hydrogen atoms, halogen atoms, cyano groups, alkyl groups and aryl groups. As for the monomers having acid groups, any vinyl compds. having acid groups which can copolymerize with the monomers having unsatd. groups expressed by formula can be used. The amts. of the unsatd. groups and the acid groups in the binder resin are preferably 10 to 90mol% and 5 to 6mol% of the copolymer, respectively, and preferably 20 to 70mol% and 10 to 40mol%. The mol.wt. of the binder resin is preferably 10000 to 500000, and more preferably 20000 to 200000.</p>
申请公布号 JPH1020496(A) 申请公布日期 1998.01.23
申请号 JP19960172517 申请日期 1996.07.02
申请人 FUJI PHOTO FILM CO LTD;FUJI FILM OORIN KK 发明人 SUZUKI NOBUO;OKITA TSUTOMU
分类号 G03F7/033;C08F2/48;C08F20/10;C08F20/40;C08F290/00;C08F299/00;G02B5/20;G03F7/038;(IPC1-7):G03F7/033 主分类号 G03F7/033
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