METHOD FOR MEASURING PATTERN OF PHOTORESIST

摘要

PROBLEM TO BE SOLVED: To measure the pattern of a photoresist by means of an image and automate the measuring by irradiating the pattern of the photoresist with ultraviolet rays and image-picking up a fluorescence image generated thereby. SOLUTION: Ultraviolet rays are emitted from a light source 3. A dichroic mirror 6 is one type of interference filters and it has a feature that when it is placed at an angle of 45.degree. with respect to an optical axis, a short wave of which wavelength is shorter than a certain waveform is reflected thereby an long wave of which wavelength is longer than a certain waveform is passed therethrough. As a result, the ultraviolet rays are reflected and introduced to an objective lens 7, the fluorescence from the lens 7 is passed therethrough. The ultraviolet rays passing through the lens 7 is cast on a specimen 8 to be projected on a photoresist of the specimen 8, then fluorescence is generated. The fluorescence passes through the lens 7 and penetrates the mirror 6. An absorption filter 9 limits a using wavelength range to be narrowed by overlapping a penetration wavelength range of the mirror 6 through which the fluorescence passing by being reflected by the specimen 8 with a penetration wavelength range of the absorption filter 9 so that a sharp image is obtained. An imaging device 10 images a fluorescence image of a pattern of the photoresist that is generated by the fluorescence.