| 摘要 |
PROBLEM TO BE SOLVED: To automatically control resist peeling liquid to a specified water concentration and dissolution resist concentration by detecting water concentration of the resist peeling liquid in a resist peeling treatment vessel with an absorptiometer, and refilling at least resist peeling stock solution or pure water. SOLUTION: The dissolution resist concentration of resist peeling liquid is detected with a absorptiometer 16, and a resist peeling stock solution and a pure water are refilled. At normal state, a liquid level is near a weir position for over-flow, and when at least the resist peeling stock solution or pure water is refilled, a degraded resist peeling liquid is overflown and automatically discharged from the water for overflow. A discharge pump 18 is not always required, a valve may be assigned instead of the discharge pump 18. Thereby, the resist peeling liquid is automatically controlled to a specified water concentration and dissolution resist concentration, and appropriate control can be performed on liquid refilling for a resist peeling treatment vessel. |
