发明名称 DEVICE AND METHOD FOR SIMULATION
摘要 PROBLEM TO BE SOLVED: To provide device and method for simulation with which accurate simulation is executed with calculation time almost equal with conventional simulation based on a diffusion equation and efficiency for semiconductor element design can be improved. SOLUTION: A processing part 103 executes a component division module 113, a diffusion parameter determination module 115 and impurity concentration determination module 117 stored in a storage part 101 so that the impurity to execute simulation can be divided into mutually independent two components at least and the concentration distribution can be found for each component by solving the diffusion equation without changing the total weight for each component. Then, the concentration distribution for each component as mentioned above is overlapped and the concentration distribution of the impurity as mentioned above can be determined.
申请公布号 JPH1022231(A) 申请公布日期 1998.01.23
申请号 JP19960172497 申请日期 1996.07.02
申请人 TOSHIBA CORP 发明人 AOKI NOBUTOSHI;KUSUNOKI NAOKI;YAMAUCHI ATSUSHI
分类号 H01L21/22;G06F17/00;G06F19/00;G06Q50/00;G06Q50/04;H01L21/00;H01L21/265 主分类号 H01L21/22
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