发明名称 Method of forming an interlayer film
摘要 <p>A method of forming an interlayer film on a substrate with a plurality of patterns formed thereon wherein the interlayer film is deposited on the substrate by a process comprising a plurality of steps in each of which a portion of the film is deposited so as to have different fluidity with the same source material. In the first aspect of the method, a portion of the interlayer film is at first deposited so as to have relatively reduced fluidity, so that the film is formed with an almost uniform thickness regardless of any pattern width on the substrate. After this, the rest portion of the film is deposited so that it has relatively increased fluidity so as to fill up the trough between the patterns. In the second aspect of the method, an undercoating film is formed in advance which is then treated to be hydrophobic so that a portion of the interlayer film deposited thereon reduces its fluidity, by which the portion is uniformly deposited regardless of any pattern width. Then, the rest portion of the film is deposited over the above portion of the film with relatively increased fluidity. &lt;IMAGE&gt;</p>
申请公布号 EP0820095(A2) 申请公布日期 1998.01.21
申请号 EP19970111871 申请日期 1997.07.11
申请人 SONY CORPORATION 发明人 HARA, MASAKI
分类号 H01L21/3105;H01L21/316;H01L21/768;(IPC1-7):H01L21/768;H01L21/310 主分类号 H01L21/3105
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