发明名称 Silica waveguide structure
摘要 A waveguide structure which is implemented in silica and doped silica includes at least one path region (53) and a confining region (52,54,55). The confining region (52,54,55) is in two regions. The first region (52,54), which is preferably formed of undoped silica and deposited by chemical vapour deposition so that it is never melted, surrounds the path region (53). The second region (55) is doped with a melting point depressant so that it has a lower melting point than the first region (52,54). The first region(52,54) provides a stabilising skeleton when complicated structures. The use of a skeleton facilitates the preparation of 3-dimensional waveguides with path regions which share a common confining region, preferably of uniformed refractive index. The path regions may be located at two or more different levels. <IMAGE>
申请公布号 EP0819956(A2) 申请公布日期 1998.01.21
申请号 EP19970202655 申请日期 1993.02.05
申请人 BRITISH TELECOMMUNICATIONS PUBLIC LIMITED COMPANY 发明人 MAXWELL, GRAEME DOUGLAS;BARBAROSSA, GIOVANNI
分类号 G02B6/122;G02B6/12;G02B6/125;G02B6/13;G02B6/132 主分类号 G02B6/122
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