| 摘要 |
PROBLEM TO BE SOLVED: To provide a high purity aluminum or high purity aluminum alloy sputtering target in which the sudden generation of particles is suppressed. SOLUTION: In a high purity aluminum (alloy) sputtering target, inclusions, particularly, oxides in the target are the main cause of particles. Furthermore, graphite-alumina composite inclusions raretively coarsely distributed in the target cause the sudden increase of particles. Then, the content of oxygen in the target is regulated to <5ppm, and furthermore, the indication equivalent to >=0.5mmϕFlat Bottom Hole in an ultrasonic test executed from the surface of the target is regulated to <0.014 pieces/cm<2> .
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