METHOD FOR SUPPLYING OXIDATION PREVENTING GAS TO SEMICONDUCTOR MANUFACTURING DEVICE,申请号JP19960182677-传众专利搜索

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发明名称	METHOD FOR SUPPLYING OXIDATION PREVENTING GAS TO SEMICONDUCTOR MANUFACTURING DEVICE
摘要
申请公布号	JPH1012636(A)	申请公布日期	1998.01.16
申请号	JP19960182677	申请日期	1996.06.25
申请人	TOSHIBA MECHATRONICS KK	发明人	ARIE MAKOTO;SATO YUICHI
分类号	H01L21/50;(IPC1-7):H01L21/50	主分类号	H01L21/50
代理机构		代理人
主权项
地址

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