| 摘要 |
PROBLEM TO BE SOLVED: To suppress extreme reduction in the focusing depth for specified patterns because of using the deformed illuminating method by selectively rotating the aperture with center at the optical axis during the exposure processing. SOLUTION: A screen part 1a of a deformed illumination aperture 1 is disposed along the same coordinate system as that of a pattern occupying most of a photomask. The energy irradiation from a light source is interrupted once, and the aperture 1 is rotated by an angleθ, according to the coordinate system of other type pattern and a second exposure is made. In the case of three types of patterns, after the second exposure has been made, it is interrupted to rotate the aperture 1 only by an angleθ'. Thus, the aperture 1 is always rotated previous to adjusting the number of revolutions of the aperture 1, so that the aperture 1 can be rotated by a specified angle between pulses.
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