| 摘要 |
PROBLEM TO BE SOLVED: To ensure high efficiency of photodegradation, high sensitivity due to the high efficiency and low diffusibility of an acid generated by exposure and to form a superior resist pattern by using a specified compd. generating sulfonic acid. SOLUTION: This photosensitive compsn. contains a resin having groups decomposed by the action of an acid and increasing the solubility of the resin in an alkali developer and a compd. represented by formula I or II and generating sulfonic acid when irradiated with active light or radiation. In the formulae, each of R1 -R5 is H, alkyl, cycloalkyl, alkoxy, hydroxy, halogen or -S-R6 , R6 is alkyl or aryl, X<-> is a compd. represented by formula III, each of R10 and R11 is independently alkyl, which may have a substituent, cycloalkyl which may have a substituent, etc., and R12 is H, halogen, etc. |
