| 摘要 |
PROBLEM TO BE SOLVED: To provide a negative resist compsn. having high sensitivity for active radiation such as UV rays, far UV rays, X-rays and electron beams and showing small changes in the line width against changes in the heating temp. after irradiation of active rays, and to provide a production method of a resist image by using this compsn. SOLUTION: This compsn. contains a resin soluble with an alkali soln., an acid producing agent, an amino resin and an epoxy compd. having one epoxy group in the molecule and having >=180 deg.C boiling point under atmospheric pressure. This negative resist compsn. is applied on a substrate, dried, irradiated with active radiation, heated and then developed with an alkali soln. to obtain a resist image. |
