HALFTONE TYPE PHASE SHIFT MASK AND ITS PRODUCTION

摘要

PROBLEM TO BE SOLVED: To provide a halftone type phase shift mask of a flush type with which stable optical characteristics and pattern shapes are easily obtainable and a process for producing the same. SOLUTION: Resist patterns are formed on a transparent substrate 1 of the halftone type phase shift mask which is formed with recessed parts 3 on the transparent substrate 1 and is provided with translucent layers 4 in these recessed parts 3. The recessed parts 3 are formed by etching the transparent substrate 1 with these resist patterns as a mask. Next, a translucent layer 4 of a desired thickness is deposited over the entire surface of the transparent substrate 1 formed with the resist patterns and the recessed parts 3. The resift patterns and the translucent layers 4 on the resists are removed to form the translucent layers 4 only in the recessed parts 3.