| 摘要 |
A metal surface cleaning process involves treatment with a microwave-generated chemically pure plasma. Preferably, the treatment is repeated 1-10 (especially 5) times and comprises a first stage employing an oxidising gas plasma (preferably an oxygen/argon, CF4, CF4/argon or especially oxygen plasma) and a second stage employing a deoxidising gas plasma (preferably an argon, argon/ammonia or especially ammonia plasma). The metal surface preferably consists of nickel, cadmium, tantalum or a mixture of these metals, especially nickel.
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