| 摘要 |
PROBLEM TO BE SOLVED: To provide a resist compsn. having high sensitivity to UV, far UV or radiation such as X-rays or electron beams and excellent in resolution by incorporating a phenolic compd. SOLUTION: This resist compsn. contains a resin soluble in an aq. alkali soln., an acid generating agent, amino resin and a phenolic compd. represented by the formula, wherein each of X<1> -X<4> is alkyl, Cl or Br, preferably 1-5C alkyl, especially preferably methyl. Bromomethyl aryl ketone or dibromomethyl aryl ketone is preferably used as the acid generating agent from the viewpoint of resolution. |
