| 摘要 |
PROBLEM TO BE SOLVED: To obtain such a photoresist soln. showing excellent uniformity of a plane and storage stability that the min. amt. necessary for coating is small, by using a mixture solvent prepared by mixing 2-heptanone and 1,2-propane diol monoalkylether in a specified mixing ratio. SOLUTION: In a radiation-sensitive coating compsn. comprising an alkali soluble resin, radiation-sensitive compd. and solvent, the solvent is a mixture solvent prepared by mixing 2-heptanone A and 1,2-propanediol monoalkylether B by 3 to 28wt.% mixing ratio [S/(A+B)]. A more preferable mixing ratio is 5 to 20wt.%. Especially when a radiation-sensitive compd. containing orthoquinone diazide groups selected from radiation-sensitive compds. is combined for the coating compsn., the coating compsn. shows especially good coating characteristics and storage stability. As for the solvent 1,2-propanediol monoalkylether B, 1,2-propanediol monomethylether is preferable. |
