发明名称 METHOD FOR MANUFACTURING FERROELECTRICS CAPACITOR AND METHOD FOR MANUFACTURING FERROELECTRICS MEMORY DEVICE
摘要 PROBLEM TO BE SOLVED: To manufacture a ferroelectrics capacitor wherein all such important conditions as selection of optimum electrode material, control of crystal growth direction and optimum anneal temperature are met, with no polarization fatigue. SOLUTION: At the interface between an iridium lower part electrode 13 and a PZT (lead zirconate titanate) thin film 14, a TiOx nucleus-adding layer 31 is deposited, and on the lower part electrode 13 where the oxide was deposited, a material layer 32 which contains an excessive specific component (especially a lead) of the PZT thin film 4 is formed, and it is thermal treated at a temperature where a surface precipitation material (especially a structure transition layer) whose main component is the specific component substantially disappears, for forming the PZT thin film 14.
申请公布号 JPH1012832(A) 申请公布日期 1998.01.16
申请号 JP19960181358 申请日期 1996.06.21
申请人 TEXAS INSTR JAPAN LTD 发明人 AOKI KATSUHIRO;FUKUDA YUKIO;NUMATA KEN;NISHIMURA AKITOSHI
分类号 G11C11/24;H01L21/822;H01L21/8242;H01L21/8246;H01L21/8247;H01L27/04;H01L27/10;H01L27/105;H01L27/108;H01L29/788;H01L29/792 主分类号 G11C11/24
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