发明名称 DEVELOPER FOR COLOR PHOTOSENSITIVE RESIN COMPOSITION
摘要 <p>PROBLEM TO BE SOLVED: To provide such a developer for a color photosensitive resin compsn. that does not cause remaining of a nonimage part after development, peeling of a pattern or reduction of a film. SOLUTION: This developer for a color photosensitive resin compsn. consists of an alkali soln. containing a nonion surfactant having polyoxyalkylene chains and aromatic groups in the molecule. Moreover, in the production of a color filter, by using tetramethylammonium hydroxide or choline as an alkali compd., a color filter layer which prevents metal ions from dissolving in a liquid crystal can be obtd.</p>
申请公布号 JPH1010748(A) 申请公布日期 1998.01.16
申请号 JP19960159638 申请日期 1996.06.20
申请人 HOECHST IND KK 发明人 KUDO TAKANORI;NOZAKI YUKO;NANJO ARINORI;YAMAGUCHI HIDEMASA
分类号 G03F7/004;B01F17/42;B01F17/52;C11D1/72;G02B5/20;G03F7/32;(IPC1-7):G03F7/32 主分类号 G03F7/004
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