| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a photosensitive film for color filters with which the production of the color filters having the good resolution of patterns without oxygen hindrance is possible even if a photosensitive resin layer is exposed after the layer in the upper part thereof is peeled and a process for producing the color filters by using the same. SOLUTION: The photosensitive resin layer of the photosensitive film having the photosensitive resin layer of 0.5 to 5μm thick and a cover film on a film base contains (A) film characteristic imparting polymer copolymerized with 17 to 30wt.% acrylic acid or methacrylic acid, (B) an ethylenic unsatd. compd., (C) a photopolymn. initiator having a morpholine ring and (D) pigments or dyes. The photosensitive resin layer and the film-like base are laminated in such a manner that the photosensitive resin layer comes into contact with the surface of the transparent substrate while the cover film of the photosensitive film for color filters is peeled. After the film-like base is peeled, the photosensitive resin layer is exposed and developed, by which the patterns are formed.</p> |
