| 摘要 |
<p>A positive resist containing naphthoquinone diazide photosensitive agent whose main component is novolack resin, as an energy beam sensitive resin (e.g., photosensitive resin) is applied to the surface of a glass substrate (1) on which transparent electrodes are formed and dried to form a photosensitive film whose thickness is 0.1-0.2 νm. The photosensitive film is exposed to ultraviolet radiation (365nm) by using a mask. In the exposed part 2', -COOH groups are produced by the reaction between moisture in the air and the resist. Then a chemically adsorbed single molecule film (6) containing carbon chains (8) by dehydrochlorinating CH3(CH2)18SiCl3 to form a liquid crystal alignment film. With this constitution, a thin uniform orientation film used for a liquid crystal display panel is manufactured with a high efficiency without doing a rubbing process, and a display panel using such an alignment film is manufactured.</p> |
