POSITIVE PHOTORESIST COMPOSITION

摘要

A positive resist composition comprising: (A) an alkali-soluble phenolic resin and (B) a photosensitive agent consisting of an ester of quinonediazidesulfonic acid with a phenol, characterized in that the component (B) contains an ester (B1) of 1,2-naphthoquinonediazide-6-sulfonic acid with a phenol wherein 10 to 70 % of the phenolic hydroxyl groups of the phenol are esterified with a photosensitive group of formula (1) resulting from 1,2-naphthoquinonediazide-6-sulfonic acid.