Target for the sputter cathode of a vacuum coating installation

摘要

Target for the sputter cathode of a vacuum coating installation is provided with a frame (3, 4, 5, 7) which at least partially surrounds the sputter material, and serves for holding the plate-shaped target on the cathode back plate (9). It is further provided with hollow profile segments (21, 21',...22, 22',...) which are located either directly on the cathode back plate or on a separating foil (20), and form cooling channels. Also claimed is a method for producing a sputter cathode.