| 摘要 |
PROBLEM TO BE SOLVED: To obtain a photosensitive film forming polymer which can be used as a base body for a laminated body of plural chip modules, etc., by using one kind of oligomer having a carboxylic acid end group and one kind of oligomer having an acyloxy end group. SOLUTION: Two kinds of oligomers are used to produce a photosensitive dielectric and insulating crosslinkable copolyester which can be used as a dielectric material for microelectronic circuits and as a photoresist film. The one oligomer has a carboxylic acid end group and the other has an acyloxy, preferably an acetoxy end group. The mixture of these oligomers is crosslinkable, in which at least one kind of the oligomers is a branched-chain oligomer and at least one kind of the two oligomers has a sensitive group for photographic planographic printing, preferably as the end group in the oligomer structure. It is preferable that the sensitive group for photosensitive planographic printing is present in the oligomer which contains a carboxylic acid end group. |
