发明名称 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION AND PRODUCTION OF RESIST IMAGE
摘要 PROBLEM TO BE SOLVED: To provide a negative photosensitive resin compsn. excellent in storage stability and to provide a production method of a resist image by using this negative photosensitive resin compsn. SOLUTION: This compsn. contains a resin soluble with an alkali soln., an acid producing agent and an amino resin. The amt. of the amino resin is 1 to 3 pts.wt. to 100 pts.wt. of the resin soluble with an alkali soln. This negative photosensitive resin compsn. is applied on a substrate, dried, exposed to light or irradiated with active rays, heated and developed with an alkali soln.
申请公布号 JPH1010730(A) 申请公布日期 1998.01.16
申请号 JP19960164742 申请日期 1996.06.25
申请人 HITACHI CHEM CO LTD;HITACHI LTD 发明人 KASUYA KEI;SASAKI MAMORU;NAKANO HAJIME;KOIBUCHI SHIGERU;HASHIMOTO MICHIAKI;UCHINO MASAICHI
分类号 G03F7/004;G03F7/038;G03F7/30;H01L21/027;(IPC1-7):G03F7/038 主分类号 G03F7/004
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