发明名称 |
NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION AND PRODUCTION OF RESIST IMAGE |
摘要 |
PROBLEM TO BE SOLVED: To provide a negative photosensitive resin compsn. excellent in storage stability and to provide a production method of a resist image by using this negative photosensitive resin compsn. SOLUTION: This compsn. contains a resin soluble with an alkali soln., an acid producing agent and an amino resin. The amt. of the amino resin is 1 to 3 pts.wt. to 100 pts.wt. of the resin soluble with an alkali soln. This negative photosensitive resin compsn. is applied on a substrate, dried, exposed to light or irradiated with active rays, heated and developed with an alkali soln. |
申请公布号 |
JPH1010730(A) |
申请公布日期 |
1998.01.16 |
申请号 |
JP19960164742 |
申请日期 |
1996.06.25 |
申请人 |
HITACHI CHEM CO LTD;HITACHI LTD |
发明人 |
KASUYA KEI;SASAKI MAMORU;NAKANO HAJIME;KOIBUCHI SHIGERU;HASHIMOTO MICHIAKI;UCHINO MASAICHI |
分类号 |
G03F7/004;G03F7/038;G03F7/30;H01L21/027;(IPC1-7):G03F7/038 |
主分类号 |
G03F7/004 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|