| 摘要 |
PROBLEM TO BE SOLVED: To provide a negative photosensitive resin compsn. having high sensitivity and high resolution and to provide a production method of a resist image with which highly integrated circuits can be easily produced. SOLUTION: This compsn. contains a resin soluble with an alkali soln., an acid producing agent, an amino resin and a phenol compd. expressed by formula. In formula, R is an alkyl group, a and b are integers 1 to 3, x and y are integers 0 to 3 satisfying (a+x)<=4 and (b+y)<=4, and when the compd. contains plural numbers of R, they may be same or different. This negative photosensitive resin compsn. is applied on a substrate, dried, exposed to light or irradiated with active radiation, heated and developed with an alkali soln. |
