PRODUCTION OF NANOMETER PARTICLES BY DIRECTED VAPOR DEPOSITION OF ELECTRON BEAM EVAPORANT

摘要

A process and apparatus for vapor depositing an evaporant onto a substrate (90) is provided which involves: presenting the substrate to a deposition chamber (100), wherein the deposition chamber has an operating pressure of from 0.001 TORR to atmospheric pressure and has coupled thereto a carrier gas stream generator (70) and an electron beam gun (30) capable of providing an electron beam at the operating pressure and contains an evaporant source (80); impinging the evaporant source with the electron beam to generate the evaporant; entraining the evaporant in the carrier gas stream; coating the substrate with the carrier gas stream which contains the entrained evaporant.