Device for protecting edge of wafer against etching liquid

摘要

The device for protecting against an etching liquid at the least the edge of a wafer (2)which is at least partially provided with a coating (1), takes the form of a hose (4) which is made of material resistant to the etching liquid, and is provided with an axial slit, where the edge of the wafer to be protected can be pushed through this slit. Also claimed is a method for applying to and removing the protecting device from a wafer.