发明名称 STACK GAS TREATING SYSTEM
摘要 <p>PROBLEM TO BE SOLVED: To provide a highly efficient stack gas treating system capable of lowering cost and saving space. SOLUTION: A boiler 1, an air preheater 3 (A/H) a gas-gas heater (GGH) heat recovery device 5, a complete-vaporization cooling tower 11, a dry electrostatic precipitator 4 (EP), a dry discharge denitrating and desulfurizing device 12, a dry electrostatic precipitator 4 (EP), a gas-gas heater (GGH) rehater 8 and a stack 9 are successively connected to constitute a stack gas treating system. A metallic parallel-plate electrode is used as a grounded electrode in the dry discharge denitrating and desulfurizing device 12, and a nozzle electrode is used as the discharge electrode. A positive-electrode voltage source is connected to the nozzle electrode to generate a corona discharge, and an injection gas is introduced into a discharge reactor from the nozzle electrode.</p>
申请公布号 JPH105542(A) 申请公布日期 1998.01.13
申请号 JP19960164659 申请日期 1996.06.25
申请人 TOSHIBA CORP 发明人 YASUI SUKEYUKI
分类号 B01D53/34;B01D53/60;B01D53/74;(IPC1-7):B01D53/60 主分类号 B01D53/34
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