发明名称 Flash EEPROM memory with improved discharge speed using substrate bias and method therefor
摘要 A floating gate cell memory device, such as an EPROM or flash EEPROM, with improved discharge speed. A negative bias is applied to the effective substrate during discharge. The negative bias increases the electric field near the junction, thereby increasing the number of hot holes which can be injected to the floating gate, improving discharge speed.
申请公布号 US5708588(A) 申请公布日期 1998.01.13
申请号 US19950464024 申请日期 1995.06.05
申请人 ADVANCED MICRO DEVICES, INC. 发明人 HADDAD, SAMEER S.;FANG, HAO
分类号 G11C16/14;H01L29/788;(IPC1-7):G06F15/00;G11C11/40 主分类号 G11C16/14
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