发明名称 TREATING DEVICE FOR WASTE GAS AND ITS METHOD
摘要 <p>PROBLEM TO BE SOLVED: To completely remove the moisture, fumes, etc., included in waste gases, to prevent the corrosion of a main duct and to easily maintain equipment by disposing a removing device for removing the moisture, fumes, etc., of the gases in addition to a scrubber device and filtering the gases by plural stages of treatments. SOLUTION: The gases admitted via an inflow pipe 32 into the removing device 30 collide against a diffusion cup 35 in a diffusion chamber 36 where the gases diffuse, their volume expands and their dew point falls. The moisture, fumes, etc., included in the gases are separated and liquefied by a temp. fall. When gaseous nitrogen is injected under a high pressure by an injection nozzle 44 to the gases discharged through the vent holes 36a of the diffusion chamber 36, the pressure around the discharged gases is dropped, by which the dew point is lowered and the moisture, etc., included in the gases are completely liquefied by the temp. fall. The waste liquid of the liquefied moisture, fumes and other impurities is partly adsorbed in a dust collecting base 37 or is discharged outside via a discharge pipe 34. The purified gases are discharged from a gas discharge pipe 33.</p>
申请公布号 JPH105532(A) 申请公布日期 1998.01.13
申请号 JP19960315306 申请日期 1996.11.26
申请人 SAMSUNG ELECTRON CO LTD 发明人 KIN KITOKU;CHO HEIKO
分类号 B01D53/34;B01D47/00;B01D49/02;B01D53/00;B01D53/26;H01L21/205;H01L21/22;H01L21/31;(IPC1-7):B01D53/34 主分类号 B01D53/34
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