发明名称 |
Precision cleaning apparatus and method |
摘要 |
A precision cleaning apparatus and method. The precision cleaning apparatus includes a cleaning monitor further comprising an acoustic wave cleaning sensor such as a quartz crystal microbalance (QCM), a flexural plate wave (FPW) sensor, a shear horizontal acoustic plate mode (SH-APM) sensor, or a shear horizontal surface acoustic wave (SH-SAW) sensor; and measurement means connectable to the sensor for measuring in-situ one or more electrical response characteristics that vary in response to removal of one or more contaminants from the sensor and a workpiece located adjacent to the sensor during cleaning. Methods are disclosed for precision cleaning of one or more contaminants from a surface of the workpiece by means of the cleaning monitor that determines a state of cleanliness and any residual contamination that may be present after cleaning; and also for determining an effectiveness of a cleaning medium for removing one or more contaminants from a workpiece.
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申请公布号 |
US5706840(A) |
申请公布日期 |
1998.01.13 |
申请号 |
US19950398276 |
申请日期 |
1995.03.03 |
申请人 |
SANDIA CORPORATION |
发明人 |
SCHNEIDER, THOMAS W.;FRYE, GREGORY C.;MARTIN, STEPHEN J. |
分类号 |
B08B3/00;G01G3/13;G01H13/00;(IPC1-7):B08B3/02 |
主分类号 |
B08B3/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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