发明名称 CURRENT CONFINEMENT FOR A VERTICAL CAVITY SURFACE EMITTING LASER
摘要 <p>A vertical cavity surface emitting laser having a planar structure, having an implantation or diffusion at the top of the mirror closest to the substrate or at the bottom of the mirror farthest from the substrate, to provide current confinement with the gain region, and having an active region and another mirror formed subsequent to the implantation or diffusion. This structure has an implantation or diffusion that does not damage or detrimentally affect the gain region, and does provide dimensions of current confinement that are accurately ascertained. Alternatively, the implantation or diffusion for current confinement may be placed within the top mirror, and several layers above the active region, still with minimal damage to the gain region and having a well-ascertained current confinement dimension.</p>
申请公布号 WO1998000895(A1) 申请公布日期 1998.01.08
申请号 US1997010825 申请日期 1997.06.23
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