发明名称 |
PHOTOPOLYMERIZABLE THERMOSETTING RESIN COMPOSITION |
摘要 |
A photopolymerizable thermosetting resin composition comprising a mixture consisting of (a) an active energy ray-setting resin and obtained by reacting an unsaturated monobasic acid copolymer resin with a cycloaliphatic epoxy group-containing unsaturated compound or reacting a cycloaliphatic epoxy groupcontaining copolymer resin with an acid group-containing unsaturated compound and (b) a photosensitive prepolymer obtained by esterifying a novolak type epoxy compound with an .alpha.-.beta.-unsaturated carboxylic acid and then further reacting with polybasic acid anhydride (and in one embodiment further reacting with an unsaturated isocyanate).
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申请公布号 |
CA2253242(A1) |
申请公布日期 |
1998.01.08 |
申请号 |
CA19972253242 |
申请日期 |
1997.06.17 |
申请人 |
CIBA SPECIALTY CHEMICALS HOLDING INC. |
发明人 |
IDO, TOYOYUKI;NOJIMA, YASUHARU |
分类号 |
G03F7/027;C08G59/00;C08G59/18;C08G59/40;G03F7/032;G03F7/033;G03F7/038;H05K3/28;(IPC1-7):G03F7/027 |
主分类号 |
G03F7/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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