发明名称 PHOTOPOLYMERIZABLE THERMOSETTING RESIN COMPOSITION
摘要 A photopolymerizable thermosetting resin composition comprising a mixture consisting of (a) an active energy ray-setting resin and obtained by reacting an unsaturated monobasic acid copolymer resin with a cycloaliphatic epoxy group-containing unsaturated compound or reacting a cycloaliphatic epoxy groupcontaining copolymer resin with an acid group-containing unsaturated compound and (b) a photosensitive prepolymer obtained by esterifying a novolak type epoxy compound with an .alpha.-.beta.-unsaturated carboxylic acid and then further reacting with polybasic acid anhydride (and in one embodiment further reacting with an unsaturated isocyanate).
申请公布号 CA2253242(A1) 申请公布日期 1998.01.08
申请号 CA19972253242 申请日期 1997.06.17
申请人 CIBA SPECIALTY CHEMICALS HOLDING INC. 发明人 IDO, TOYOYUKI;NOJIMA, YASUHARU
分类号 G03F7/027;C08G59/00;C08G59/18;C08G59/40;G03F7/032;G03F7/033;G03F7/038;H05K3/28;(IPC1-7):G03F7/027 主分类号 G03F7/027
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