发明名称 |
Apparatus and method for wet cleaning or etching of flat substrates |
摘要 |
<p>An apparatus (1) for wet cleaning or etching of flat substrates (9) comprising a tank (3) with an inlet opening (5) and outlet opening (7) for said substrates. Said tank contains a cleaning liquid (11) and is installed in a gaseous environment (13). At least one of the openings is a slice in a sidewall of the tank and is present below the liquid-surface (15). In the tank (3) there may be a portion (25) above the liquid (11) filled with a gas with a pressure being lower than the pressure within said environment (13). The method comprises the step of transferring a substrate through the cleaning or etching liquid at a level underneath the surface of said liquid making use of said apparatus. <IMAGE></p> |
申请公布号 |
EP0817246(A2) |
申请公布日期 |
1998.01.07 |
申请号 |
EP19970870087 |
申请日期 |
1997.06.23 |
申请人 |
INTERUNIVERSITAIR MICROELEKTRONICA CENTRUM VZW |
发明人 |
MEURIS, MARC;MERTENS, PAUL;HEYNS, MARC |
分类号 |
H01L21/00;(IPC1-7):H01L21/00 |
主分类号 |
H01L21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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