| 摘要 |
A Mg source 3 is received in a vessel 1 having an opening 8, and the vessel 1 is heated at 670 DEG C. or higher to effuse Mg vapor through the opening 8. Since the vessel 1 is filled with Mg vapor, Mg is evaporated from molten state under stable condition without fluctuations in evaporation speed. The Mg vapor is effectively consumed for vapor deposition. A reflector plate may be provided at the outlet of the opening 8, or a duct for introducing Mg vapor from the vessel to the surface of a substrate sheet may be provided. In order to evaporate Mg from stabilized molten state, operational conditions are preferably determined so as to satisfy the relationships of W1/W2<0.6x(PMg/V3) and W1/W2<0.04xPMg, wherein W1 represents the area (mm2) of the opening 8, W2 represents the evaporation surface area (mm2) of the Mg source 3, PMg represents Mg vapor pressure (torr.) and V represents the degree of vacuum.
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