发明名称 Radiation-sensitive mixture
摘要 A radiation-sensitive mixture which contains (a) a compound of the formula (I) <IMAGE> (I) where R1 is an optionally substituted alkyl radical, R2 is a hydrogen atom or an optionally substituted alkyl radical containing 1 to 4 carbon atoms, R3 is an n-valent, optionally polymeric aliphatic or aromatic radical and n is a number from 1 to 100; and b) a compound which forms a strong acid on exposure to actinic radiation.
申请公布号 US5705317(A) 申请公布日期 1998.01.06
申请号 US19950567775 申请日期 1995.12.05
申请人 AGFA-GEVAERT AG 发明人 EICHHORN, MATHIAS;BUHR, GERHARD
分类号 G03F7/004;G03F7/039;(IPC1-7):G03F7/004 主分类号 G03F7/004
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