发明名称 |
Radiation-sensitive mixture |
摘要 |
A radiation-sensitive mixture which contains (a) a compound of the formula (I) <IMAGE> (I) where R1 is an optionally substituted alkyl radical, R2 is a hydrogen atom or an optionally substituted alkyl radical containing 1 to 4 carbon atoms, R3 is an n-valent, optionally polymeric aliphatic or aromatic radical and n is a number from 1 to 100; and b) a compound which forms a strong acid on exposure to actinic radiation.
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申请公布号 |
US5705317(A) |
申请公布日期 |
1998.01.06 |
申请号 |
US19950567775 |
申请日期 |
1995.12.05 |
申请人 |
AGFA-GEVAERT AG |
发明人 |
EICHHORN, MATHIAS;BUHR, GERHARD |
分类号 |
G03F7/004;G03F7/039;(IPC1-7):G03F7/004 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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