发明名称 Apparatus for inspecting surface defects with regularly reflected light and peripherally scattered light
摘要 Virtually all of the light reflected from an object to be inspected is made incident upon a focusing lens 7, a quantity of light in a regularly reflected light region on an plane P1 where an image is formed by a lens 7 is detected by a photodiode 8, while a quantity of light in a peripherally scattered light region is detected by a photodiode 9. If the quantity of light received (VDET1) in the regularly reflected light region is lower than a first reference value (VREF1) (S1=1), and the quantity of light received (VDET2) in the peripheral scattered light region is higher than a second reference value (VREF2) (S2=1), a determination is made that a defect is present.
申请公布号 US5706081(A) 申请公布日期 1998.01.06
申请号 US19970852702 申请日期 1997.05.07
申请人 NSK LTD. 发明人 FUKASAWA, TOSHIO;EISHIMA, MASAMI;NAGAI, SHINICHIRO;ONO, JUNICHI
分类号 G01B11/30;G01N21/88;G01N21/93;(IPC1-7):G01N21/00;G01N21/84 主分类号 G01B11/30
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