| 摘要 |
A reconfigurable mask for forming erasable patterns is disclosed. The mask includes material having optical properties manipulated by nonphysical means. In a preferred embodiment, the mask includes a liquid crystal array formed by materials that are transparent to the exposure light. A phase-shift mask can also be formed by controlling the refractive index of each cell. The mask can be used to form mask patterns that compensate for overexposure at corners of a mask pattern. |
