发明名称 |
Method of filling pores in anodized aluminum parts |
摘要 |
Anodized aluminum coatings employed in semiconductor processing equipment are treated to reduce their sensitivity to halogenated species. The pores of the aluminum oxide surface can be filled either by a metal, such as magnesium or aluminum, forming the corresponding metal oxide that is resistant to reaction with halogens, or by filling the pores with a getter for halogens, such as hydrogen ions. The hydrogen ions adsorbed on the surface of the aluminum oxide react with halogens to form volatile hydrogen halides that can be pumped away in the exhaust system of the semiconductor processing chambers, thereby preventing or reducing reaction of the underlying aluminum oxide with the halogens.
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申请公布号 |
US5705225(A) |
申请公布日期 |
1998.01.06 |
申请号 |
US19960619263 |
申请日期 |
1996.03.18 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
DORNFEST, CHARLES;REDEKER, FRED C.;FODOR, MARK ANTHONY;BERCAW, CRAIG;TOMOZAWA, H. STEVEN |
分类号 |
C25D11/18;(IPC1-7):C23C16/28 |
主分类号 |
C25D11/18 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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