| 摘要 |
PROBLEM TO BE SOLVED: To enable a transmission fine pattern and the other pattern to be properly and concurrently transferred by a method wherein an X-ray absorbing layer prescribed in thickness is provided to a part or all of a transmission pattern below prescribed dimensions. SOLUTION: An X-ray absorbent pattern 1 of thickness t is formed on an X-ray transmitting thin film 6 for the formation of an X-ray mask, wherein the transmission patterns 5a and 5b out of transmission patterns of the X-ray mask are above prescribed dimensions and so set to have a height difference 1 of t with light shielding patterns 7e, 7f, and 7g. On the other hand, X-ray absorbent layers 4a, 4b, 4c, and 4d of thickness t2 are provided in the fine transmission patterns 2a, 2b, 2c, and 2d out of the X-ray mask, which are smaller than prescribed dimensions, so as to enable the fine patterns 2a, 2b, 2c, and 2d to have a height difference 3 of t1 with the light shielding patterns 7a, 7b, 7c, 7d, and 7e. Therefore, an X-ray intensity distribution on which the height difference 3 of t1 and the layers 4a, 4b, 4c, and 4d are combined to have an effect is formed. |
