发明名称 |
SEMICONDUCTOR LIGHT EMITTING DIODE AND ITS MANUFACTURING METHOD |
摘要 |
PROBLEM TO BE SOLVED: To provide a semiconductor light emitting diode having semiinsulating current constricting layer made of III-V nitride. SOLUTION: A III-V nitride 105 is grown using an SiNx film as a selective growing mask while doping the nitride 105 so as to contain carbon atoms in the concentration exceeding 10<17> /cm<3> . The formed nitride layer 105 becoming a semiinsulating layer can be used as a clad layer of a current constricting layer and a light guide path. In such a constitution, the semi-insulating layer of a specific shape can be grown thereby enabling a high performance light emitting diode to be formed. Furthermore, the III-V nitride layer is to be grown by gas MBE process using a compound having alkyl radical for either a group III material or a group V material. |
申请公布号 |
JPH104246(A) |
申请公布日期 |
1998.01.06 |
申请号 |
JP19960177031 |
申请日期 |
1996.06.17 |
申请人 |
FURUKAWA ELECTRIC CO LTD:THE |
发明人 |
HIRATANI YUJI |
分类号 |
H01L33/14;H01L33/32;H01L33/34;H01S5/00;H01S5/323 |
主分类号 |
H01L33/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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