ZWEILAGENPHOTORESISTSTRUKTUR UND VERFAHREN ZU IHRER HERSTELLUNG

摘要

This invention relates to a double-layer resist characterized by comprising a thin film whose principal constituent is a conjugated system polymer and resist, wherein a thin film excellent in shading capability, anti-reflection property, and uniformity is provided and, thus, a radiation-sensitive double-layer resist to create fine resist patterns stable in workability can be provided.